Electronic structure of two interacting phosphorus δ-doped layers in silicon

Density functional theory is used to quantify the interaction of a pair of 1/4-monolayer phosphorus δ-doped layers in silicon. We investigate changes in the electronic structure as the distance between the two δ-doped layers is altered and identify the onset of interactions between the transverse an...

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Main Authors: Carter, Damien, Warschkow, O., Marks, Nigel, McKenzie, D.
Format: Journal Article
Published: American Physical Society 2013
Online Access:http://hdl.handle.net/20.500.11937/22808
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author Carter, Damien
Warschkow, O.
Marks, Nigel
McKenzie, D.
author_facet Carter, Damien
Warschkow, O.
Marks, Nigel
McKenzie, D.
author_sort Carter, Damien
building Curtin Institutional Repository
collection Online Access
description Density functional theory is used to quantify the interaction of a pair of 1/4-monolayer phosphorus δ-doped layers in silicon. We investigate changes in the electronic structure as the distance between the two δ-doped layers is altered and identify the onset of interactions between the transverse and longitudinal bands. The calculations show that the valley splitting is insensitive to the separation distance, while the interlayer band splittings are insensitive to the representation used to describe the dopant disorder. These observations are exploited in a hybrid model which enables the calculation of accurate splittings of realistically disordered systems at tractable computational cost.
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institution Curtin University Malaysia
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publishDate 2013
publisher American Physical Society
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spelling curtin-20.500.11937-228082017-09-13T16:00:11Z Electronic structure of two interacting phosphorus δ-doped layers in silicon Carter, Damien Warschkow, O. Marks, Nigel McKenzie, D. Density functional theory is used to quantify the interaction of a pair of 1/4-monolayer phosphorus δ-doped layers in silicon. We investigate changes in the electronic structure as the distance between the two δ-doped layers is altered and identify the onset of interactions between the transverse and longitudinal bands. The calculations show that the valley splitting is insensitive to the separation distance, while the interlayer band splittings are insensitive to the representation used to describe the dopant disorder. These observations are exploited in a hybrid model which enables the calculation of accurate splittings of realistically disordered systems at tractable computational cost. 2013 Journal Article http://hdl.handle.net/20.500.11937/22808 10.1103/PhysRevB.87.045204 American Physical Society fulltext
spellingShingle Carter, Damien
Warschkow, O.
Marks, Nigel
McKenzie, D.
Electronic structure of two interacting phosphorus δ-doped layers in silicon
title Electronic structure of two interacting phosphorus δ-doped layers in silicon
title_full Electronic structure of two interacting phosphorus δ-doped layers in silicon
title_fullStr Electronic structure of two interacting phosphorus δ-doped layers in silicon
title_full_unstemmed Electronic structure of two interacting phosphorus δ-doped layers in silicon
title_short Electronic structure of two interacting phosphorus δ-doped layers in silicon
title_sort electronic structure of two interacting phosphorus δ-doped layers in silicon
url http://hdl.handle.net/20.500.11937/22808