Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism

In the age when the miniaturization trend that has driven the semiconductor industry is reaching its limits, organic modification of semiconductors is emerging as a field that could give much-needed impetus. We review the current state of understanding of the functionalization of C(100), Si(100), an...

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Main Authors: Bilic, Ante, Reimers, J., Hush, N.
Other Authors: Gruetter, P.
Format: Book Chapter
Published: Imperial College Press 2006
Subjects:
Online Access:http://ebooks.worldscinet.com/physics/9781860948053/9781860948053.shtml
http://hdl.handle.net/20.500.11937/10096
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author Bilic, Ante
Reimers, J.
Hush, N.
author2 Gruetter, P.
author_facet Gruetter, P.
Bilic, Ante
Reimers, J.
Hush, N.
author_sort Bilic, Ante
building Curtin Institutional Repository
collection Online Access
description In the age when the miniaturization trend that has driven the semiconductor industry is reaching its limits, organic modification of semiconductors is emerging as a field that could give much-needed impetus. We review the current state of understanding of the functionalization of C(100), Si(100), and Ge(100) surfaces through chemisorption of alkenes and alkynes, focussing on adsorbate structural control. While reactions on C(100) show most of the properties expected for concerted cycloaddition reactions such as [2+2] and [4+2] (Diels-Alder) processes, reactions on Si(100) present a wide range of variant behaviour, including in some cases the prominence of non-cycloaddition products. More general stepwise free-radical addition processes are seen to provide a better description of reactions on Si(100), their prominence being attributed to either the non-existence or ineffectiveness of p bonding within surface silicon dimers. The investigations of these systems provide not only insight into driving mechanisms for chemisorption but also motivation for the development of new techniques of organic functionalization on semiconductors.
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spelling curtin-20.500.11937-100962017-08-23T07:20:32Z Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism Bilic, Ante Reimers, J. Hush, N. Gruetter, P. Rosei, F. Hofer, W. semiconductor functionalization - p bonding. free-radical reactions cycloaddition silicon dimer surface structure chemisorption In the age when the miniaturization trend that has driven the semiconductor industry is reaching its limits, organic modification of semiconductors is emerging as a field that could give much-needed impetus. We review the current state of understanding of the functionalization of C(100), Si(100), and Ge(100) surfaces through chemisorption of alkenes and alkynes, focussing on adsorbate structural control. While reactions on C(100) show most of the properties expected for concerted cycloaddition reactions such as [2+2] and [4+2] (Diels-Alder) processes, reactions on Si(100) present a wide range of variant behaviour, including in some cases the prominence of non-cycloaddition products. More general stepwise free-radical addition processes are seen to provide a better description of reactions on Si(100), their prominence being attributed to either the non-existence or ineffectiveness of p bonding within surface silicon dimers. The investigations of these systems provide not only insight into driving mechanisms for chemisorption but also motivation for the development of new techniques of organic functionalization on semiconductors. 2006 Book Chapter http://hdl.handle.net/20.500.11937/10096 http://ebooks.worldscinet.com/physics/9781860948053/9781860948053.shtml Imperial College Press fulltext
spellingShingle semiconductor functionalization
- p bonding. free-radical reactions
cycloaddition
silicon dimer
surface structure
chemisorption
Bilic, Ante
Reimers, J.
Hush, N.
Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism
title Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism
title_full Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism
title_fullStr Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism
title_full_unstemmed Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism
title_short Functionalization of semiconductor surfaces by organic layers: Concerted cycloaddition versus stepwise free-radical reaction mechanism
title_sort functionalization of semiconductor surfaces by organic layers: concerted cycloaddition versus stepwise free-radical reaction mechanism
topic semiconductor functionalization
- p bonding. free-radical reactions
cycloaddition
silicon dimer
surface structure
chemisorption
url http://ebooks.worldscinet.com/physics/9781860948053/9781860948053.shtml
http://hdl.handle.net/20.500.11937/10096