Hung, N., Ali, M. Y., Fu, Y., Ong, N., & Tay, M. (2001). Surface integrity and removal rate of silicon sputtered with focused ion beam. Taylor and Francis Inc.
Chicago Style CitationHung, NguyenPhu, Mohammad Yeakub Ali, Yongqi Fu, NanShing Ong, and MengLeong Tay. Surface Integrity and Removal Rate of Silicon Sputtered With Focused Ion Beam. Taylor and Francis Inc, 2001.
MLA CitationHung, NguyenPhu, et al. Surface Integrity and Removal Rate of Silicon Sputtered With Focused Ion Beam. Taylor and Francis Inc, 2001.
Warning: These citations may not always be 100% accurate.